Fabrication by vaporized film deposition and in situ FET measurements of polycrystalline thiophene/phenylene co-oligomer films

Herein, we present a vapor film deposition method for fabricating polycrystalline films of a thiophene/phenylene co-oligomer. The polycrystalline film has comparable physical and optical characteristics, e.g. an amplified spontaneous emission, to those of the single-crystal phase as the film consist...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2020-03, Vol.59 (SD), p.SDDA17
Main Authors: Potisat, Pananus, Dokiya, Shohei, Mizuno, Hitoshi, Sasaki, Fumio, Yanagi, Hisao
Format: Article
Language:English
Subjects:
Crystals
Deposition
Grain size
Hole mobility
Optical properties
Polycrystals
Single crystals
Spontaneous emission
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Summary:Herein, we present a vapor film deposition method for fabricating polycrystalline films of a thiophene/phenylene co-oligomer. The polycrystalline film has comparable physical and optical characteristics, e.g. an amplified spontaneous emission, to those of the single-crystal phase as the film consists of tiny single crystals with a grain size of 5-20 m. Meanwhile, in situ FET results illustrate the dominant unipolar p-type characteristics with a hole mobility of 0.025 cm2 V−1 s−1, higher than the conventional physically deposited films owing to the standing molecular orientation.
ISSN:0021-4922
1347-4065
DOI:10.7567/1347-4065/ab53c9