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Surface and electrochemical characterization of aryl films grafted on polycrystalline copper from the diazonium compounds using the rotating disk electrode method

In this paper, aryl films are grafted via electrochemical reduction of two different diazonium salts, 4-nitrobenzenediazonium tetrafluoroborate and Fast Red AL salt, in different conditions on polycrystalline copper electrodes. For the surface modification, “normal” electrografting, redox grafting (...

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Bibliographic Details
Published in:Journal of electroanalytical chemistry (Lausanne, Switzerland) Switzerland), 2018-05, Vol.817, p.89-100
Main Authors: Mooste, Marek, Kibena-Põldsepp, Elo, Marandi, Margus, Matisen, Leonard, Sammelselg, Väino, Podvorica, Fetah I., Tammeveski, Kaido
Format: Article
Language:English
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Summary:In this paper, aryl films are grafted via electrochemical reduction of two different diazonium salts, 4-nitrobenzenediazonium tetrafluoroborate and Fast Red AL salt, in different conditions on polycrystalline copper electrodes. For the surface modification, “normal” electrografting, redox grafting (RG) and for the first time, RG and rotating disk electrode combined method are used. The obtained aryl films are characterized by X-ray photoelectron spectroscopy and atomic force microscopy. Surface concentrations of redox active moieties are determined in acetonitrile and highest values of ca. 25 and 12 nmol cm−2 are obtained in case of nitrophenyl and anthraquinone films, respectively. Different aryl films exhibit unequal blocking action toward ferricyanide probe and also variable degree of inhibition of the O2 reduction rate. [Display omitted] •Polycrystalline Cu electrodes were modified via reduction of aryldiazonium salts.•Redox grafting and rotating disk electrode combined modification method was used.•The barrier properties of the prepared aryl-films on Cu electrodes were explored.•The blocking behavior was studied toward oxygen and ferricyanide reduction.•The decay of aryl-films was observed due to potential cycling in acetonitrile.
ISSN:1572-6657
1873-2569
DOI:10.1016/j.jelechem.2018.03.070