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Post-etching cleaning influences the resin shear bond strength to CAD/CAM lithium-disilicate ceramics

Statement of problem The hydrofluoric acid (HF) is able to promote selective dissolution of the glassy phase in silica-based ceramic. However, the etching leaves insoluble silica-fluoride salts in the surface that affects negatively the bond, affirming the need of a post-etching cleaning. Purpose Ev...

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Bibliographic Details
Published in:Applied adhesion science 2017-10, Vol.5 (1), p.1, Article 17
Main Authors: Bruzi, Greciana, Carvalho, Adriana Oliveira, Giannini, Marcelo, Maia, Hamilton Pires, Magne, Pascal
Format: Article
Language:English
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Summary:Statement of problem The hydrofluoric acid (HF) is able to promote selective dissolution of the glassy phase in silica-based ceramic. However, the etching leaves insoluble silica-fluoride salts in the surface that affects negatively the bond, affirming the need of a post-etching cleaning. Purpose Evaluate the shear bond strength (SBS) of composite resin to CAD/CAM lithium-disilicate ceramics after different post-etching cleaning and silane treatments. Methods Twenty-four 2 mm-thick slices of IPS e.max CAD (Ivoclar Vivadent, AG, Schann, Liechtenstein) were crystallized, embedded in acrylic resin, polished and cleaned in an ultrasonic bath. Each specimen was etched with 5% HF for 20 s, rinsed for 60 s, and treatment was completed using surface cleaning and silanization. The cleaning methods were: AW—air/water spray; UB—ultrasonic bath; PA—37% phosphoric acid; and ST—steam cleaning. The cleaned surface received: E—no silane treatment; E/S—silane application for 20 s, air drying for 20 s and hot drying (60 °C) for 20 s; E/S+—silane application for 60 s, air drying for 20 s, hot air drying (60 °C) for 20 s, rinsing with boiling water for 15 s and hot air drying for 20 s. Cylinders of composite resin (n = 12) (Z100, 3M-ESPE, Saint Paul, MN, USA) were bonded using an adhesive resin (Optibond FL adhesive, Kerr Corp, Orange, CA, USA). SBS testing was carried out after 24 h of storage in water. Samples for each post-etching cleaning regimen were analyzed by SEM. Results According to two-way ANOVA (Bonferroni-corrected post hoc tests, p 
ISSN:2196-4351
2196-4351
DOI:10.1186/s40563-017-0096-6