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Post-etching cleaning influences the resin shear bond strength to CAD/CAM lithium-disilicate ceramics
Statement of problem The hydrofluoric acid (HF) is able to promote selective dissolution of the glassy phase in silica-based ceramic. However, the etching leaves insoluble silica-fluoride salts in the surface that affects negatively the bond, affirming the need of a post-etching cleaning. Purpose Ev...
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Published in: | Applied adhesion science 2017-10, Vol.5 (1), p.1, Article 17 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Statement of problem
The hydrofluoric acid (HF) is able to promote selective dissolution of the glassy phase in silica-based ceramic. However, the etching leaves insoluble silica-fluoride salts in the surface that affects negatively the bond, affirming the need of a post-etching cleaning.
Purpose
Evaluate the shear bond strength (SBS) of composite resin to CAD/CAM lithium-disilicate ceramics after different post-etching cleaning and silane treatments.
Methods
Twenty-four 2 mm-thick slices of IPS e.max CAD (Ivoclar Vivadent, AG, Schann, Liechtenstein) were crystallized, embedded in acrylic resin, polished and cleaned in an ultrasonic bath. Each specimen was etched with 5% HF for 20 s, rinsed for 60 s, and treatment was completed using surface cleaning and silanization. The cleaning methods were: AW—air/water spray; UB—ultrasonic bath; PA—37% phosphoric acid; and ST—steam cleaning. The cleaned surface received: E—no silane treatment; E/S—silane application for 20 s, air drying for 20 s and hot drying (60 °C) for 20 s; E/S+—silane application for 60 s, air drying for 20 s, hot air drying (60 °C) for 20 s, rinsing with boiling water for 15 s and hot air drying for 20 s. Cylinders of composite resin (n = 12) (Z100, 3M-ESPE, Saint Paul, MN, USA) were bonded using an adhesive resin (Optibond FL adhesive, Kerr Corp, Orange, CA, USA). SBS testing was carried out after 24 h of storage in water. Samples for each post-etching cleaning regimen were analyzed by SEM.
Results
According to two-way ANOVA (Bonferroni-corrected post hoc tests, p |
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ISSN: | 2196-4351 2196-4351 |
DOI: | 10.1186/s40563-017-0096-6 |