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Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography
We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast ve...
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Published in: | Microelectronic engineering 2017-05, Vol.176, p.106-110 |
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Main Authors: | , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films.
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•Methylammonium lead iodide thin film nanoimprinting approach is proposed.•V-groove nanostructures are transferred to the photoactive material via Pulsed-NIL.•The technique allows to perform the step in less than 1s.•The preliminary trials show the possibility to scale up the process. |
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ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/j.mee.2017.02.023 |