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Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography

We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast ve...

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Bibliographic Details
Published in:Microelectronic engineering 2017-05, Vol.176, p.106-110
Main Authors: Cefarin, Nicola, Cian, Alessandro, Sonato, Agnese, Sovernigo, Enrico, Suran, Fabio, Teklu, Zekarias, Zanut, Alessandra, Pozzato, Alessandro, Tormen, Massimo
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Language:English
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Summary:We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films. [Display omitted] •Methylammonium lead iodide thin film nanoimprinting approach is proposed.•V-groove nanostructures are transferred to the photoactive material via Pulsed-NIL.•The technique allows to perform the step in less than 1s.•The preliminary trials show the possibility to scale up the process.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2017.02.023