Study of TiO2 Films: Temperature Impact on the Morphology and Phase Structure

This manuscript presents the results of titanium dioxide thin films study which were produced from organotitanium precursor films by thermal treatment or UV radiation. The organotitanium precursor films were deposited on a glass or foil substrate by centrifugation. XRD and AFM measurements confirmed...

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Bibliographic Details
Published in:Key engineering materials 2016-02, Vol.683, p.3-8
Main Authors: Sozinov, Sergey, Titov, Fiodor, Sachkov, Victor I., Sotnikova, Larisa, Popova, Anna N., Stepanov, Anton, Vladimirov, Alexander
Format: Article
Language:English
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Summary:This manuscript presents the results of titanium dioxide thin films study which were produced from organotitanium precursor films by thermal treatment or UV radiation. The organotitanium precursor films were deposited on a glass or foil substrate by centrifugation. XRD and AFM measurements confirmed the formation of well-crystallized titanium dioxide films with anatase structure at temperature of 400°C. The study of the surface morphology of anatase films showed the formation of surface with crystallographic indices (101). The choice of amorphous and crystalline titanium dioxide thin films for XRD analysis was experimentally justified.
ISSN:1013-9826
1662-9795
1662-9795
DOI:10.4028/www.scientific.net/KEM.683.3