Depth control of a silicon structure fabricated by 100q keV Ar ion beam lithography

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Bibliographic Details
Published in:Applied surface science 2007-01, Vol.253 (6), p.3284-3291
Main Authors: KAWASEGI, Noritaka, MORITA, Noboru, YAMADA, Shigeru, TAKANO, Noboru, OYAMA, Tatsuo, MOMOTA, Sadao, TANIGUCHI, Jun, MIYAMOTO, Iwao
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Physics
Online Access:Get full text
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ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2006.07.037