Advanced photo resist removal using O3 and moist UPW in semiconductor production

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Bibliographic Details
Main Authors: PHILIT, G, ASWEGE, L. V, VICTOURON, Y, MADORE, M, WOLKE, K, CLECH, M. C, ASSELIN-DEGRUNGE, E, CHABLI, A, LOUIS, D
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
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ISSN:0161-6374
2576-1579