Low-k materials etch and strip optimization for sub 0.25μm technology

Saved in:
Bibliographic Details
Main Authors: GAO, T, GRAY, W. D, VAN HOVE, M, ROSSEEL, E, STRUYF, H, MEYNEN, H, VANHAELEMEERSCH, S, MAEX, K
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Metallization, contacts, interconnects
device isolation
Microelectronic fabrication (materials and surfaces technology)
Microelectronics: LSI, VLSI, ULSI
integrated circuit fabrication technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
DOI:10.1109/IITC.1999.787076