In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation

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Bibliographic Details
Main Authors: MANTESE, L, SELINIDIS, K, WILSON, P. T, LIM, D, JIANG, Y. Y, EKERDT, J. G, DOWNER, M. C
Format: Conference Proceeding
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0169-4332
1873-5584