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Investigation of electron-hole recombination-activated partial dislocations and their behavior in 4H-SiC epitaxial layers
Electron-hole recombination-activated partial dislocations in 4H silicon carbide homoepitaxial layers and their behavior have been studied using synchrotron X-ray topography and electroluminescence. Stacking faults whose expansion was activated by electron-hole recombination enhanced dislocation gli...
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Published in: | Journal of electronic materials 2008-05, Vol.37 (5 ; May 2008) |
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Main Authors: | , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | Electron-hole recombination-activated partial dislocations in 4H silicon carbide homoepitaxial layers and their behavior have been studied using synchrotron X-ray topography and electroluminescence. Stacking faults whose expansion was activated by electron-hole recombination enhanced dislocation glide were observed to be bounded by partial dislocations, which appear as white stripes or narrow dark lines in back-reflection X-ray topographs recorded using the basal plane reflections. Such contrast variations are attributable to the defocusing/focusing of the diffracted X-rays due to the edge component of the partial dislocations, which creates a convex/concave distortion of the basal planes. Simulation results based on the ray-tracing principle confirm our argument. Observations also indicate that, when an advancing partial dislocation interacts with a threading screw dislocation, a partial dislocation dipole is dragged behind in its wake. This partial dislocation dipole is able to advance regardless of the immobility of the C-core segment. A kink pushing mechanism is introduced to interpret the advancement of this partial dislocation dipole. |
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ISSN: | 0361-5235 1543-186X |
DOI: | 10.1007/s11664-007-0328-9 |