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An axial dispersion model of competing ion etching and mixing of binary solids
Ion bombardment of solid surfaces produces a number of changes in the nearsurface region. The surface is etched by ejection of material by momentum exchange. The surface concentrations of the components of a multicomponent solid, such as an alloy, are altered by preferential sputtering. Finally, the...
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Published in: | AIChE journal 1993-02, Vol.39 (2), p.294-301 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Ion bombardment of solid surfaces produces a number of changes in the nearsurface region. The surface is etched by ejection of material by momentum exchange. The surface concentrations of the components of a multicomponent solid, such as an alloy, are altered by preferential sputtering. Finally, the incident ions penetrate a distance into the solid, producing a damaged region referred to as the “altered layer” in which diffusion is enhanced relative to that in the unaltered bulk. Previous models have not explicitly accounted for the ion penetration depth and the discontinuity of solid diffusivities at this boundary. We demonstrate that this problem is directly analogous to that of a plug‐flow reactor with axial dispersion, and solve for steady‐state and transient concentration profiles in a binary solid, taking into account the different values of the “Peclet number” appropriate for the two regions, the altered layer and the unaltered bulk of the solid. |
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ISSN: | 0001-1541 1547-5905 |
DOI: | 10.1002/aic.690390210 |