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Molecular Beam Epitaxy of Superconducting (Rb,Ba)BiO sub 3

The simple cubic perovskite (Rb,Ba)BiO sub 3 can be grown at temperatures < 350 deg C by molecular beam epitaxy using a rf plasma atomic oxygen source. Films with superconducting onsets in resistivity as high as 27K are obtained without annealing. The epitaxy proceeds in the normal (100) orientat...

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Bibliographic Details
Published in:Applied physics letters 1989-11, Vol.55 (20), p.2120-2122
Main Authors: Hellman, E S, Hartford, E H, Fleming, R M
Format: Article
Language:English
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Summary:The simple cubic perovskite (Rb,Ba)BiO sub 3 can be grown at temperatures < 350 deg C by molecular beam epitaxy using a rf plasma atomic oxygen source. Films with superconducting onsets in resistivity as high as 27K are obtained without annealing. The epitaxy proceeds in the normal (100) orientation on {100} SrTiO sub 3 , despite a 10% lattice mismatch. (110) epitaxy and spotty reflection high-energy electron diffraction (RHEED) patterns are obtained on {100} MgO substrates, despite the good lattice match for (100) growth. Streaked and spotty RHEED patterns have been obtained on either substrate. Sticking coefficients for bismuth depend on the growth conditions, indicating that the epitaxy is partially controlled by desorption kinetics. Graphs, diffraction patterns. 12 ref.--AA
ISSN:0003-6951
1077-3118
DOI:10.1063/1.102343