Progress toward a microsecond duration, repetitive, intense-ion beam accelerator

Summary form only given. A number of intense ion beam applications are emerging requiring repetitive high-average-power beams. These applications include ablative deposition of thin films, rapid melt and resolidification for surface property enhancement, advanced diagnostic neutral beams for the nex...

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Bibliographic Details
Main Authors: Davis, A., Reass, W.A., Coates, D.M., Schleinitz, H.M., Greenly, J.B., Lovberg, R.H.
Format: Conference Proceeding
Language:English
Subjects:
Acceleration
ACCELERATORS
Anodes
Coils
Diodes
Ion accelerators
ION BEAMS
ION SOURCES
Magnetic fields
MAGNETIC INSULATION
PARTICLE ACCELERATORS
Particle beams
Plasma accelerators
PLASMA PRODUCTION
Plasma sources
THERMIONIC DIODES
US Department of Energy
USES
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Summary:Summary form only given. A number of intense ion beam applications are emerging requiring repetitive high-average-power beams. These applications include ablative deposition of thin films, rapid melt and resolidification for surface property enhancement, advanced diagnostic neutral beams for the next generation of Tokamaks, and intense pulsed-neutron sources. We are developing a 250 keV, 15 kA, 1/spl mu/s duration, 1-30 Hz intense-ion beam accelerator called CHAMP (continuous high average-power microsecond pulser). The accelerator will use a magnetically insulated extraction diode in ballistically focused geometry.
ISSN:0730-9244
2576-7208
DOI:10.1109/PLASMA.1997.604800