Loading…

Topological Insulator State in Thin Bismuth Films Subjected to Plane Tensile Strain

The results of experimental examination of galvanomagnetic properties of thin bismuth films subjected to plane tensile strain resulting from the difference in thermal expansion coefficients of the substrate material and bismuth are presented. The resistivity, the magnetoresistance, and the Hall coef...

Full description

Saved in:
Bibliographic Details
Published in:Physics of the solid state 2018-03, Vol.60 (3), p.457-460
Main Authors: Demidov, E. V., Grabov, V. M., Komarov, V. A., Kablukova, N. S., Krushel’nitskii, A. N.
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The results of experimental examination of galvanomagnetic properties of thin bismuth films subjected to plane tensile strain resulting from the difference in thermal expansion coefficients of the substrate material and bismuth are presented. The resistivity, the magnetoresistance, and the Hall coefficient were studied at temperatures ranging from 5 to 300 K in magnetic fields as strong as 0.65 T. Carrier densities were calculated. A considerable increase in carrier density in films thinner than 30 nm was observed. This suggests that surface states are more prominent in thin bismuth films on mica substrates, while the films themselves may exhibit the properties of a topological insulator.
ISSN:1063-7834
1090-6460
DOI:10.1134/S106378341803006X