Performance predictions of a focused ion beam from a laser cooled and compressed atomic beam

Focused ion beams are indispensable tools in the semiconductor industry because of their ability to image and modify structures at the nanometer length scale. Here, we report on performance predictions of a new type of focused ion beam based on photo-ionization of a laser cooled and compressed atomi...

Full description

Saved in:
Bibliographic Details
Published in:Journal of applied physics 2014-12, Vol.116 (24)
Main Authors: ten Haaf, G., Wouters, S. H. W., van der Geer, S. B., Vredenbregt, E. J. D., Mutsaers, P. H. A.
Format: Article
Language:English
Subjects:
Aberration
ACCELERATION
ALGORITHMS
Applied physics
ATOMIC BEAMS
BEAM CURRENTS
BRIGHTNESS
CHROMATIC ABERRATIONS
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
Computer simulation
COMPUTERIZED SIMULATION
Electric field strength
ELECTRIC FIELDS
FLUX DENSITY
Genetic algorithms
GEOMETRICAL ABERRATIONS
ION BEAMS
Ionization
Laser beams
Laser cooling
Low currents
Mathematical analysis
MATHEMATICAL MODELS
PARTICLE ACCELERATORS
Performance prediction
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Focused ion beams are indispensable tools in the semiconductor industry because of their ability to image and modify structures at the nanometer length scale. Here, we report on performance predictions of a new type of focused ion beam based on photo-ionization of a laser cooled and compressed atomic beam. Particle tracing simulations are performed to investigate the effects of disorder-induced heating after ionization in a large electric field. They lead to a constraint on this electric field strength which is used as input for an analytical model which predicts the minimum attainable spot size as a function of, amongst others, the flux density of the atomic beam, the temperature of this beam, and the total current. At low currents (I 
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4905022