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Particle-in-cell simulation of an electronegative plasma under direct current bias studied in a large range of electronegativity

A one-dimensional electronegative plasma situated between two symmetrical parallel electrodes under DC bias is studied by Particle-In-Cell simulation with Monte Carlo Collisions. By varying the electronegativity α≡n−/ne from the limit of electron-ion plasmas (negative ion free) to ion-ion plasmas (e...

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Bibliographic Details
Published in:Physics of plasmas 2013-04, Vol.20 (4)
Main Authors: Oudini, N., Raimbault, J.-L., Chabert, P., Meige, A., Aanesland, A.
Format: Article
Language:English
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Summary:A one-dimensional electronegative plasma situated between two symmetrical parallel electrodes under DC bias is studied by Particle-In-Cell simulation with Monte Carlo Collisions. By varying the electronegativity α≡n−/ne from the limit of electron-ion plasmas (negative ion free) to ion-ion plasmas (electron free), the sheaths formation, the negative ion flux flowing towards the electrodes, and the particle velocities at the sheath edges are investigated. Depending on α, it is shown that the electronegative plasma behavior can be described by four regimes. In the lowest regime of α, i.e., α < 50, negative ions are confined by two positive sheaths within the plasma, while in the higher regimes of α, a negative sheath is formed and the negative ion flux can be extracted from the bulk plasma. In the two intermediate regimes of α, i.e., 50 < α < 105, both the electron and the negative ion fluxes are involved in the neutralization of the positive ions flux that leaves the plasma. In particular, we show that the velocity of the negative ions entering the negative sheath is affected by the presence of the electrons, and is not given by the modified Bohm velocity generally accepted for electronegative plasmas. For extremely high electronegativity, i.e., α > 105, the presence of electrons in the plasma is marginal and the electronegative plasma can be considered as an ion-ion plasma (electron free).
ISSN:1070-664X
1089-7674
DOI:10.1063/1.4798501