Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition

Based on the multiple-grid particle-in-cell code, an advanced simulation model is established to study the sheath physics and dose uniformity along the sample stage in order to provide the theoretical basis for further improvement of enhanced glow discharge plasma immersion ion implantation and depo...

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Bibliographic Details
Published in:Journal of applied physics 2009-07, Vol.106 (1), p.013313-013313-3
Main Authors: Li, Liuhe, Li, Jianhui, Kwok, Dixon T. K., Wang, Zhuo, Chu, Paul K.
Format: Article
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
DEPOSITION
DIELECTRIC MATERIALS
ELECTRIC DISCHARGES
EXPANSION
FOCUSING
GLOW DISCHARGES
ION IMPLANTATION
MATERIALS
MATERIALS SCIENCE
PLASMA SHEATH
PLASMA SIMULATION
SIMULATION
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Summary:Based on the multiple-grid particle-in-cell code, an advanced simulation model is established to study the sheath physics and dose uniformity along the sample stage in order to provide the theoretical basis for further improvement of enhanced glow discharge plasma immersion ion implantation and deposition. At t = 7.0   μ s , the expansion of the sheath in the horizontal direction is hindered by the dielectric cage. The electron focusing effect is demonstrated by this model. Most of the ions at the inside wall of the cage are implanted into the edge of the sample stage and a relatively uniform ion fluence distribution with a large peak is observed at the end. Compared to the results obtained from the previous model, a higher implant fluence and larger area of uniformity are disclosed.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.3160309