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Oxygen vacancy and hydrogen in amorphous HfO2

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2023-06, Vol.56 (24)
Main Authors: Sklénard, Benoît, Cvitkovich, Lukas, Waldhoer, Dominic, Li, Jing
Format: Article
Language:English
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ISSN:0022-3727
1361-6463
DOI:10.1088/1361-6463/acc878