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Tunneling Transistors Based on MoS2/MoTe2 Van der Waals Heterostructures

2-D transition metal dichalcogenides (TMDs) are promising materials for CMOS application due to their ultrathin channel with excellent electrostatic control. TMDs are especially well suited for tunneling field-effect transistors (TFETs) due to their low-dielectric constant and their promise of atomi...

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Bibliographic Details
Published in:IEEE journal of the Electron Devices Society 2018-01, Vol.6, p.1048-1055
Main Authors: Balaji, Yashwanth, Mocuta, Dan, Groeseneken, Guido, Smets, Quentin, De La Rosa, Cesar Javier Lockhart, Lu, Anh Khoa Augustin, Chiappe, Daniele, Agarwal, Tarun, Lin, Dennis H. C., Huyghebaert, Cedric, Radu, Iuliana
Format: Article
Language:English
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Summary:2-D transition metal dichalcogenides (TMDs) are promising materials for CMOS application due to their ultrathin channel with excellent electrostatic control. TMDs are especially well suited for tunneling field-effect transistors (TFETs) due to their low-dielectric constant and their promise of atomically sharp and self-passivated interfaces. Here, we experimentally demonstrate band-to-band tunneling (BTBT) in Van der Waals heterostructures formed by MoS 2 and MoTe 2 . Density functional theory simulations of the band structure show our MoS 2 -MoTe 2 heterojunctions have a staggered band alignment, which boosts BTBT compared to a homojunction configuration. Low-temperature measurements and electrostatic simulations provide understanding toward the role of Schottky contacts and the material thickness on device performance. Negative differential transconductance-based devices were also demonstrated using a different device architecture. This paper provides the prerequisites and challenges required to overcome at the contact region to achieve a steep subthreshold slope and high ON-currents with 2-D-based TFETs.
ISSN:2168-6734
DOI:10.1109/JEDS.2018.2815781