Consequences of photon beam excitation in an inductively coupled plasma

Summary form only given. In this paper we present results from a numerical study of an inductively coupled plasma (ICP) system which is excited by a photon beam. The hybrid plasma equipment model (HPEM), modified to include the Monte Carlo photon beam (MCPB) module, is the simulation tool used in th...

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Bibliographic Details
Main Authors: Keiter, E.R., Kushner, M.J.
Format: Conference Proceeding
Language:English
Subjects:
Absorption
CHEMICAL REACTORS
ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
ETCHING
MATERIALS SCIENCE
Monte Carlo methods
NUMERICAL ANALYSIS
Optical coupling
PARAMETRIC ANALYSIS
Particle beam injection
Particle beams
PHOTON BEAMS
Plasma applications
Plasma density
Plasma materials processing
PLASMA PRODUCTION
PLASMA SIMULATION
Plasma sources
PROCESS CONTROL
SEMICONDUCTOR MATERIALS
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Description
Summary:Summary form only given. In this paper we present results from a numerical study of an inductively coupled plasma (ICP) system which is excited by a photon beam. The hybrid plasma equipment model (HPEM), modified to include the Monte Carlo photon beam (MCPB) module, is the simulation tool used in the study. The MCPB models the injection and propagation of a photon beam through a plasma processing reactor using a Monte Carlo simulation. Photon absorption in the plasma is described using a variable particle weighting method. Multiple photon species are allowed, and photon absorption cross sections for photolysis and ionization are input through a parser. Source rates for charged and neutral species, which result from photon absorption, are generated by the MCPB and used by the fluid module of the HPEM. We will present the results of a parametric study of the effects of an auxiliary photon source on species densities and plasma potential for a Cl/sub 2/ etching plasma.
ISSN:0730-9244
2576-7208
DOI:10.1109/PLASMA.1998.677916