1/f Noise and DC Characterization of Partially Depleted SOI N-and P-MOSFETs from 20 º C-250 º C

A summary of measured small-signal parameters and low frequency noise characterized over temperature is presented for N- and P- MOSFETs fabricated in a partially depleted SOI 0.8 mum process. Small-signal dc parameters critical in analog circuit design are reported including device transconductance...

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Bibliographic Details
Main Authors: Ericson, M.N., Hasanuzzaman, M., Terry, S.C., Britton, C.L., Ohme, B., Frank, S.S., Richmond, J.A., Blalock, B.J.
Format: Conference Proceeding
Language:English
Subjects:
1f noise
Analog circuits
Circuit noise
Frequency measurement
Low-frequency noise
MOSFET circuits
Noise measurement
Temperature
Threshold voltage
Transconductance
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Summary:A summary of measured small-signal parameters and low frequency noise characterized over temperature is presented for N- and P- MOSFETs fabricated in a partially depleted SOI 0.8 mum process. Small-signal dc parameters critical in analog circuit design are reported including device transconductance efficiency (g m /I d ), output resistance (r ds ), and threshold voltage (V t ). These parameters are summarized as a function of both gate length (0.8mum, 2.0mum, 5.0mum, and 20mum) and temperature (20deg to 300degC). Noise characterization of these devices is also presented with an emphasis on flicker noise over temperature (20deg to 250degC). Data is presented in terms of both drain current and inversion coefficient, where appropriate. Use of this information provides the designer with an excellent tool for estimating analog circuit performance in applications where wide temperature range performance is required
ISSN:1095-323X
2996-2358
DOI:10.1109/AERO.2005.1559566