Fault detection in reactive ion etching systems using one-class support vector machines

A robust method to detect faults in reactive ion etching systems using optical emission spectroscopy data is proposed. The approach is based on one-class support vector machines (SVMs). Unlike previously proposed fault detection methods, this approach only requires data collected during normal equip...

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Bibliographic Details

Main Authors:	Sarmiento, T., Hong, S.J., May, G.S.
Format:	Conference Proceeding
Language:	English
Subjects:	Circuit faults Electrical fault detection Etching Fault detection Neural networks Particle beam optics Plasma applications Stimulated emission Support vector machine classification Support vector machines
Citations:	Items that cite this one
Online Access:	Request full text
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