Color filtering metallization for optoelectronic 100nm CMOS circuits

We show a novel color filter system that can be implemented in a standard CMOS process without any additional chemicals and processing, using standard CMOS metals like aluminum. The filter uses sub-wavelength aperture and grating arrays allowing some light wavelengths through while blocking others....

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Bibliographic Details
Main Authors: Schmidt, D.J., Pianetta, P.A.
Format: Conference Proceeding
Language:English
Subjects:
Aluminum
Apertures
Chemical processes
Circuits
CMOS process
Color
Diodes
Filtering
Filters
Metallization
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Description
Summary:We show a novel color filter system that can be implemented in a standard CMOS process without any additional chemicals and processing, using standard CMOS metals like aluminum. The filter uses sub-wavelength aperture and grating arrays allowing some light wavelengths through while blocking others. Furthermore, we show an integrated photo-detector, both as a standard junction diode and an MSM diode which combines the filters and detector into the simplest color imaging system. The experimental data is explained with simulations and electromagnetic theory.
DOI:10.1109/IEDM.2003.1269305