Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwavelength material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scatterin...

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Bibliographic Details
Published in:Optics express 2009-06, Vol.17 (12), p.9515-9525
Main Authors: Cheng, G, Mishchik, K, Mauclair, C, Audouard, E, Stoian, R
Format: Article
Language:English
Subjects:
Computer-Aided Design
Engineering Sciences
Equipment Design
Equipment Failure Analysis
Glass - chemistry
Glass - radiation effects
Lasers
Optics
Photochemistry - methods
Photonic
Refractometry - instrumentation
Refractometry - methods
Reproducibility of Results
Sensitivity and Specificity
Silicon Dioxide - chemistry
Silicon Dioxide - radiation effects
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Summary:Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwavelength material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scattering and reflection characteristics. We report here on the formation of waveguiding structures with remarkable polarization effects for infrared light. The photoinscription process using 800 nm femtosecond laser pulses is accompanied by third harmonic generation and polarization dependent anisotropic scattering of UV photons. The photowritten structures can be arranged in three-dimensional patterns generating complex propagation and polarization effects due to the anisotropic optical properties.
ISSN:1094-4087
1094-4087
DOI:10.1364/oe.17.009515