Integrated micro-plasmas in silicon operating in helium

. Microplasma arrays operating in helium in a DC regime have been produced in silicon microreactors. Cathode boundary layer (CBL) type microdevices were elaborated using clean room facilities and semiconductor processing techniques. Ignition of the micro-discharge arrays having either 50 or 100  m d...

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Bibliographic Details
Published in:The European physical journal. D, Atomic, molecular, and optical physics Atomic, molecular, and optical physics, 2010-12, Vol.60 (3), p.601-608
Main Authors: Dussart, R., Overzet, L. J., Lefaucheux, P., Dufour, T., Kulsreshath, M., Mandra, M. A., Tillocher, T., Aubry, O., Dozias, S., Ranson, P., Lee, J. B., Goeckner, M.
Format: Article
Language:English
Subjects:
Applications of Nonlinear Dynamics and Chaos Theory
Atomic
Electric discharges
Exact sciences and technology
Molecular
Optical and Plasma Physics
Physical Chemistry
Physics
Physics and Astronomy
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma Physics
Quantum Information Technology
Quantum Physics
Spectroscopy/Spectrometry
Spintronics
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Summary:. Microplasma arrays operating in helium in a DC regime have been produced in silicon microreactors. Cathode boundary layer (CBL) type microdevices were elaborated using clean room facilities and semiconductor processing techniques. Ignition of the micro-discharge arrays having either 50 or 100  m diameter cavities was studied. Two different structures (isotropically etched or anisotropically etched cavity) and various conditions (the two different voltage polarities, pressures etc.) were investigated. 100 microdischarges of 50  μ m diameter could be ignited in parallel at 1000 torr. At high current, some parasitic and transient sparks appeared at the edge of the sample. When the polarization was reversed (cathode side corresponding the opened electrode), more current was needed to light all the microdischarges. A thermally affected zone around the hole on the anode side was obtained after operation.
ISSN:1434-6060
1434-6079
DOI:10.1140/epjd/e2010-00272-7