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Admittance spectroscopy of cadmium free CIGS solar cells heterointerfaces
Cadmium free Cu(In,Ga)Se 2 (CIGS) solar cells, prepared with indium sulfide buffer layers In 2S 3 deposited by Atomic Layer Chemical Vapor Deposition, were investigated by admittance spectroscopy. The admittance spectroscopy performed on various solar cells with different deposition conditions of th...
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Published in: | Thin solid films 2006-07, Vol.511 (Complete), p.320-324 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Cadmium free Cu(In,Ga)Se
2 (CIGS) solar cells, prepared with indium sulfide buffer layers In
2S
3 deposited by Atomic Layer Chemical Vapor Deposition, were investigated by admittance spectroscopy. The admittance spectroscopy performed on various solar cells with different deposition conditions of the In
2S
3 buffer layer reveals two types of defects: a shallow level N
1 and a deeper one N
2. The same situation is also found generally in CdS/CIGS based solar cells. For this latter kind of solar cells, it has been well established that the N
2-type defect is located in the CIGS bulk whereas the spatial location of the N
1-type defect is not well defined. To address this issue we performed admittance spectroscopy on CIGS based solar cells with In
2S
3 buffer layer and we compared these results with those obtained from CIGS solar cells with CdS buffer layer. From the Meyer–Neldel behaviour observed on the pre-exponential factor of defect emission frequencies, we can well derive the capture cross-sections of the different defects on both kinds of devices coated with In
2S
3 or CdS. More precisely, it was found that for both kinds of devices, the N
1-type defect has the same capture cross-section regardless of the dispersion of its activation energy. As a result we can assume that this defect is most likely located in the CIGS absorber layer next to the heterointerface. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2005.11.087 |