Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

The chemical, structural, mechanical and optical properties of thin aluminum oxide films deposited at room temperature (RT) and 800 °C on (100) Si and Si–SiO 2 substrates by pulsed laser deposition and plasma enhanced chemical vapor deposition are investigated and compared. All films are smooth and...

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Bibliographic Details
Published in:Thin solid films 2008-01, Vol.516 (6), p.1290-1296
Main Authors: Cibert, C., Hidalgo, H., Champeaux, C., Tristant, P., Tixier, C., Desmaison, J., Catherinot, A.
Format: Article
Language:English
Subjects:
Aluminum oxide
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Laser deposition
Materials science
Mechanical and acoustical properties
Methods of deposition of films and coatings
film growth and epitaxy
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
PECVD
Physical properties of thin films, nonelectronic
Physics
PLD
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin films properties
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Summary:The chemical, structural, mechanical and optical properties of thin aluminum oxide films deposited at room temperature (RT) and 800 °C on (100) Si and Si–SiO 2 substrates by pulsed laser deposition and plasma enhanced chemical vapor deposition are investigated and compared. All films are smooth and near stoichiometric aluminum oxide. RT films are amorphous, whereas γ type nano-crystallized structures are pointed out for films deposited at 800 °C. A dielectric constant of ∼ 9 is obtained for films deposited at room temperature and 11–13 for films deposited at 800 °C. Young modulus and hardness are in the range 116–254 GPa and 6.4–28.8 GPa respectively. In both cases, the results show that the deposited films have very interesting properties opening applications in mechanical, dielectric and optical fields.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2007.05.064