Loading…

Diffusion and activation of dopants in silicon and advanced silicon-based materials

Saved in:
Bibliographic Details
Published in:Physica scripta 2006-09, Vol.2006, p.89-96
Main Authors: Pichler, Peter, Ortiz, Christophe J, Colombeau, Benjamin, Cowern, Nicholas E B, Lampin, Evelyne, Uppal, Suresh, Karunaratne, M S A, Bonar, Janet M, Willoughby, Arthur F W, Claverie, Alain, Cristiano, Filadelfo, Lerch, Wilfried, Paul, Silke
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:1402-4896
0031-8949
1402-4896
DOI:10.1088/0031-8949/2006/T126/021