Nanoimprinted TiO[sub.2] Metasurfaces with Reduced Meta-Atom Aspect Ratio and Enhanced Performance for Holographic Imaging

Metasurface holograms, with the capability to manipulate spatial light amplitudes and phases, are considered next-generation solutions for holographic imaging. However, conventional fabrication approaches for meta-atoms are heavily dependent on electron-beam lithography (EBL), a technique known for...

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Bibliographic Details
Published in:Materials 2024-05, Vol.17 (10)
Main Authors: Zhang, Kaiyu, Lin, Yuqi, Qiu, Yang, Zhao, Xingyan, Zheng, Shaonan, Dong, Yuan, Zhong, Qize, Hu, Ting
Format: Article
Language:English
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Summary:Metasurface holograms, with the capability to manipulate spatial light amplitudes and phases, are considered next-generation solutions for holographic imaging. However, conventional fabrication approaches for meta-atoms are heavily dependent on electron-beam lithography (EBL), a technique known for its expensive and time-consuming nature. In this paper, a polarization-insensitive metasurface hologram is proposed using a cost-effective and rapid nanoimprinting method with titanium dioxide (TiO[sub.2]) nanoparticle loaded polymer (NLP). Based on a simulation, it has been found that, despite a reduction in the aspect ratio of meta-atoms of nearly 20%, which is beneficial to silicon master etching, NLP filling, and the mold release processes, imaging efficiency can go up to 54% at wavelength of 532 nm. In addition, it demonstrates acceptable imaging quality at wavelengths of 473 and 671 nm. Moreover, the influence of fabrication errors and nanoimprinting material degradation in terms of residual layer thickness, meta-atom loss or fracture, thermal-induced dimensional variation, non-uniform distribution of TiO[sub.2] particles, etc., on the performance is investigated. The simulation results indicate that the proposed device exhibits a high tolerance to these defects, proving its applicability and robustness in practice.
ISSN:1996-1944
1996-1944
DOI:10.3390/ma17102273