XUV Conversion Efficiency in a Low-Intensity KrF Laser Plasma for Projection Lithography

Measurements of XUV conversion efficiency in the 2028OeV range were made on a low intensity (7 x 1 O10 W/ cm2) KrF laser-produced plasma with seven targets of varying Z. Novel mass-limited targets were studied to develop ultra-low debris laser-targets for projection lithography. This article is from...

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Bibliographic Details
Main Authors: Rockett, Paul D, Hunter, John A, Kensek, Ron, Olson, Richard E, Kubiak, Glenn D
Format: Report
Language:English
Subjects:
Component Reports
CONVERSION
DEBRIS
EFFICIENCY
LASER TARGETS
LASERS
LITHOGRAPHY
MASS
MEASUREMENT
Photography
TARGETS
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Summary:Measurements of XUV conversion efficiency in the 2028OeV range were made on a low intensity (7 x 1 O10 W/ cm2) KrF laser-produced plasma with seven targets of varying Z. Novel mass-limited targets were studied to develop ultra-low debris laser-targets for projection lithography. This article is from 'OSA Proceedings of the Topical Meeting on Soft-X-Ray Projection Lithography Held in Monterey, California on 10-12 April 1991. Volume 12', AD-A252 998, p76-79.