Fano Resonance Membrane Reflectors from Mid-Infrared to Far-Infrared

We report here single layer ultra-compact Fano resonance photonic crystal membrane reflectors at mid-infrared and far-infrared bands, based on single layer crystalline Si membranes. High performance reflectors were designed for surface-normal incidence illumination with center operation wavelengths...

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Bibliographic Details
Main Authors: Shuai, Yichen, Zhao, Deyin, Yang, Weiquan, Zhou, Weidong, Seo, Jung-Hun, Ma, Zhenqiang, Medhi, Gautam, Peale, Robert, Buchwald, Walter, Soref, Richard
Format: Report
Language:English
Subjects:
BBR(BROADBAND REFLECTORS)
BROADBAND
FANO RESONANCE
FAR INFRARED RADIATION
FINITE DIFFERENCE TIME DOMAIN
FOURIER TRANSFORMATION
INFRARED SPECTROMETERS
MID-INFRARED RADIATION
Optics
PE611102
PHOTONIC CRYSTALS
Radiofrequency Wave Propagation
RCWA(RIGOROUS COUPLED-WAVE ANALYSIS)
REACTIVE ION ETCHING
REFLECTORS
RESONANCE
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Summary:We report here single layer ultra-compact Fano resonance photonic crystal membrane reflectors at mid-infrared and far-infrared bands, based on single layer crystalline Si membranes. High performance reflectors were designed for surface-normal incidence illumination with center operation wavelengths of 1.5 um, 8 um, and 75 um, respectively. Large area patterned membrane reflectors were also fabricated and transferred onto glass substrates based on PDMS stamp assisted membrane transfer processes. Close to 100% reflection was obtained at 76 um, with a single layer Si membrane thickness of 18 um. Such Fano resonance based membrane reflectors, offer great opportunities for high performance ultra-compact dielectric reflectors at infrared and THz regions. The original document contains color images. Presented at the IEE Photonics Conference held on 25 Oct 2011. Sponsored in part by AFOSR. Prepared in cooperation with the Department of Electrical Engineering, NanoFAB Center, University of Texas at Arlington, the Department of Electrical and Computer Engineering, University of Wisconsin-Madison, and the Physics Department, University of Central Florida, Orlando.