Rolling Nanoelectrode Lithography
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pres...
Saved in:
| Published in: | Micromachines (Basel) 2020-06, Vol.11 (7), p.656 |
|---|---|
| Main Authors: | , , |
| Format: | Article |
| Language: | eng |
| Subjects: | |
| Online Access: | Get full text |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between the roller and the silicon specimen, so that the local oxidation process occurred uniformly over a large area of the specimen. In this work, a brass roller wrapped with a fabricated polycarbonate strip was used as a stamp to generate nanopatterns on a silicon surface. The experimental results show that a uniform pattern transfer for a large area can be achieved with this new rolling nanoelectrode lithography approach. The rolling speed and the applied bias voltage were identified as the primary control parameters for oxide growth. Furthermore, the pattern direction showed no significant influence on the oxide process. We therefore demonstrated that nanoelectrode lithography can be scaled up for large-area nanofabrication by incorporating a roller stamp. |
|---|---|
| ISSN: | 2072-666X 2072-666X |