Distributions of hafnia and titania cores in EUV metal resists evaluated by scanning transmission electron microscopy and electron energy loss spectroscopy

The morphologies of hafnia (HfOx) and titania (TiOx) cores and their distributions in metal resists for EUV lithography were characterized at the atomic level by scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy (EELS). The HfOx cores show a higher affinity to or...

Full description

Saved in:
Bibliographic Details
Published in:Applied physics express 2016-11, Vol.9 (11), p.111801
Main Authors: Toriumi, Minoru, Sato, Yuta, Koshino, Masanori, Suenaga, Kazu, Itani, Toshiro
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The morphologies of hafnia (HfOx) and titania (TiOx) cores and their distributions in metal resists for EUV lithography were characterized at the atomic level by scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy (EELS). The HfOx cores show a higher affinity to organic components, such as methacrylic acid and benzoic acid, than the TiOx cores, and the same core-shell state as in a solution is almost completely maintained in the HfOx resist film. Furthermore, it was found that the surface modification of the TiOx cores by silylation is effective for preventing their aggregation and improves the postcoating delay (PCD) of the resist.
ISSN:1882-0778
1882-0786
DOI:10.7567/APEX.9.111801