Development of SSQ Based 157 nm Photoresist

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Bibliographic Details
Published in:Journal of photopolymer science and technology 2002, Vol.15 (4), p.693-698
Main Authors: Hung, Raymond J., Yamachika, Mikio, Iwasawa, Haruo, Hayashi, Akihiro, Yamahara, Noboru, Shimokawa, Tsutomu
Format: Article
Language:English
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.15.693