Properties of Atomic Layer Deposited HfO 2 Films on Ge Substrates Depending on Process Temperatures

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Bibliographic Details
Published in:Journal of the Electrochemical Society 2012, Vol.159 (4), p.G33-G39
Main Authors: Jung, Hyung-Suk, Kim, Hyo Kyeom, Yu, Il-Hyuk, Lee, Sang Young, Lee, Joohwi, Park, Jinho, Jang, Jae Hyuck, Jeon, Sang-Ho, Chung, Yoon Jang, Cho, Deok-Yong, Lee, Nae-In, Park, Tae Joo, Choi, Jung-Hae, Hwang, Cheol Seong
Format: Article
Language:English
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ISSN:0013-4651
1945-7111
DOI:10.1149/2.014204jes