Proximity Effect Correction for Mask Writing Taking Resist Development Processes into Account

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2009-09, Vol.48 (9), p.95004
Main Authors: Abe, Takayuki, Matsumoto, Hiroshi, Shibata, Hayato, Motosugi, Tomoo, Kato, Yasuo, Ohnishi, Takayuki, Yashima, Jun, Iijima, Tomohiro, Anze, Hirohito
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.48.095004