Loading…

A Robust Embedded Ladder-Oxide/Cu Multilevel Interconnect Technology for 0.13 µm Complementary Metal Oxide Semiconductor Generation

Saved in:

Bibliographic Details
Published in:	Japanese Journal of Applied Physics 2007-03, Vol.46 (3R), p.954
Main Authors:	Oda, Noriaki, Ito, Shinya, Takewaki, Toshiyuki, Shiba, Kazutoshi, Kunishima, Hiroyuki, Hironaga, Nobuo, Honma, Ichiro, Nanba, Hiroaki, Yokogawa, Shinji, Kameyama, Akiko, Goto, Takayuki, Usami, Tatsuya, Ohto, Koichi, Kubo, Akira, Suzuki, Mieko, Yamamoto, Yoshiaki, Watanabe, Susumu, Yamada, Kenta, Ikeda, Masahiro, Ueno, Kazuyoshi, Horiuchi, Tadahiko
Format:	Article
Language:	English
Citations:	Items that this one cites Items that cite this one
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!