Fabrication of X-Ray Masks Using the Silicon Direct Write Electron-Beam Lithography Process and Complementary Electron-Sensitive Resists

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2002, Vol.41 (Part 1, No. 6B), p.4122-4126
Main Authors: Lavallée, Eric, Beauvais, Jacques, Drouin, Dominique, Cloutier, Mélanie, Yang, Pan, Awad, Yousef, Turcotte, David, Lafrance, Pierre
Format: Article
Language:English
Online Access:Get full text
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.4122