Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2002-06, Vol.41 (Part 1, No. 6A), p.4031-4031
Main Authors: Ogawa, Taro, Ito, Masaaki, Takahashi, Masashi, Hoko, Hiromasa, Yamanashi, Hiromasa, Hoshino, Eiichi, Okazaki, Shinji, Sekine, Keiichi, Kataoka, Izumi
Format: Article
Language:English
Online Access:Get full text
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.4031