Energy-filtered Electron Interferometry in Reflection Electron Microscopy
We studied energy-filtered interferometry in reflection electron microscopy (REM) geometry for the first time. An ultra-high vacuum electron microscope (UHV-EM) equipped with a field emission gun (FEG), a Möllenstedt-type electron biprism and an omega-type energy-filter was used. The specimen was a...
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| Published in: | Japanese Journal of Applied Physics 2001, Vol.40 (4R), p.2527 |
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| Main Authors: | , , , , |
| Format: | Article |
| Language: | eng |
| Online Access: | Get full text |
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| Summary: | We studied energy-filtered interferometry in reflection electron microscopy (REM) geometry for the first time. An ultra-high vacuum electron microscope (UHV-EM) equipped with a field emission gun (FEG), a Möllenstedt-type electron biprism and an omega-type energy-filter was used. The specimen was a well-defined Si(111) 7×7 clean surface. Single and multiple surface plasmon excitation is significant in a reflection electron energy loss spectrum (REELS) taken from the surface. The following was found in the REM geometry for the first time. Visibility of carrier fringes in the interference region formed by no-plasmon-loss electrons is higher than that in an unfiltered one. The carrier fringes are also visible in the interferograms formed by electrons exciting the surface plasmon once or twice. The lateral coherent length of the electrons exciting the surface plasmon once is narrower (about 45 nm) than that of the no-plasmon-loss electrons (about 90 nm). |
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| ISSN: | 0021-4922 1347-4065 |