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Tight-binding Molecular Dynamics Simulation of Desorbed SiO Molecule during the Oxidation of Si(111) Surface
Tight-binding molecular dynamics calculations have been carried out to study the SiO desorption at high temperature during the oxidation of Si(111) surface. In our model, the on-top site of SiO at the Si(111) surface was heated partially on purpose. The high wagging and stretching energies related t...
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Published in: | Japanese Journal of Applied Physics 1999-04, Vol.38 (4S), p.2434 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Tight-binding molecular dynamics calculations have been carried out to study the SiO
desorption at high temperature during the oxidation of Si(111) surface. In our model, the
on-top site of SiO at the Si(111) surface was heated partially on purpose. The high
wagging and stretching energies related to the SiO are considered to be the origin of
SiO desorption for the present calculations. Vibrational frequencies at the oxygen
adsorption site on Si(111) surface and both rovibrational and translational energies of
desorbed SiO molecule were calculated and compared with the experimental results.
The SiO molecule desorbed at the thermal equilibrium state which is in agreement with the experimental results. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.38.2434 |