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Development of a method for investigating carbon removal processes during photoassisted film growth using organometallic precursors: Application to platinum
A method is used to investigate carbon removal pathways during metal film growth using organometallic precursors. The approach combines a time-of-flight mass spectrometer with a growth chamber from which substrates can be removed during real-time film growth. Consequently, evolving mass spectral sig...
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| Published in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2007-01, Vol.25 (1), p.104-109 |
|---|---|
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
| Citations: | Items that this one cites Items that cite this one |
| Online Access: | Get full text |
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| Summary: | A method is used to investigate carbon removal pathways during metal film growth using organometallic precursors. The approach combines a time-of-flight mass spectrometer with a growth chamber from which substrates can be removed during real-time film growth. Consequently, evolving mass spectral signatures can be correlated with changing film properties. Although more general as a technique, results are presented for the photoassisted growth of Pt from
C
H
3
Cp
Pt
(
C
H
3
)
3
in a
D
2
atmosphere. Here, a marked increase in deuterium/hydrogen exchange is clearly correlated with an increase in the Pt:C ratio for the metal films, as determined by x-ray photoelectron spectroscopy. However, results for growth with
C
H
3
C
H
2
Cp
Pt
(
C
H
3
)
3
as well as
(
C
H
3
)
3
C
Cp
Pt
(
C
H
3
)
3
suggest that while extensive
D
∕
H
exchange can be a feature of the growth process, it is not a prerequisite for producing films with relatively high Pt:C ratios. |
|---|---|
| ISSN: | 0734-2101 1520-8559 |
| DOI: | 10.1116/1.2400681 |