Prediction of fabrication distortions in step and flash imprint lithography templates

Step and flash imprint lithography (SFIL) is an alternative approach for printing sub-100 nm features that relies on chemical and mechanical techniques to transfer patterns. The imprint process requires no projection optics and is performed at room temperature with low imprint pressures to reduce th...

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Bibliographic Details
Published in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2002-11, Vol.20 (6), p.2891-2895
Main Authors: Martin, C. J., Engelstad, R. L., Lovell, E. G., Resnick, D. J., Weisbrod, E. J.
Format: Article
Language:English
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Summary:Step and flash imprint lithography (SFIL) is an alternative approach for printing sub-100 nm features that relies on chemical and mechanical techniques to transfer patterns. The imprint process requires no projection optics and is performed at room temperature with low imprint pressures to reduce thermal and mechanical template distortions. Because imprint lithographies are 1× pattern transfer processes that preclude magnification corrections, the minimization of template distortions during fabrication and imprinting is critical. The processes and materials used in the fabrication of SFIL templates are similar to those used in the manufacturing of optical masks. The various process steps have been simulated using finite element techniques in order to predict the resulting pattern distortions. Two proposed template fabrication schemes were modeled, the resulting pattern distortions compared, and the error sources were quantified.
ISSN:0734-211X
1071-1023
1520-8567
DOI:10.1116/1.1521743