Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate

Saved in:
Bibliographic Details
Published in:Superconductor science & technology 2021-08, Vol.34 (8), p.85016
Main Authors: Shibalov, M V, Mumlyakov, A M, Trofimov, I V, Timofeeva, E R, Sirotina, A P, Pershina, E A, Tagachenkov, A M, Anufriev, Y V, Zenova, E V, Porokhov, N V, Tarkhov, M A
Format: Article
Language:English
Subjects:
atomic layer deposition (ALD)
critical current density
multistep process
niobium nitride
superconductor
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0953-2048
1361-6668
DOI:10.1088/1361-6668/ac0d09