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Physical adsorption and oxidation of ultra-thin MoS 2 crystals: insights into surface engineering for 2D electronics and beyond
The oxidation mechanism of atomically thin molybdenum disulfide (MoS ) plays a critical role in its nanoelectronics, optoelectronics, and catalytic applications, where devices often operate in an elevated thermal environment. In this study, we systematically investigate the oxidation of mono- and fe...
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Published in: | Nanotechnology 2023-10, Vol.34 (40), p.405701 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The oxidation mechanism of atomically thin molybdenum disulfide (MoS
) plays a critical role in its nanoelectronics, optoelectronics, and catalytic applications, where devices often operate in an elevated thermal environment. In this study, we systematically investigate the oxidation of mono- and few-layer MoS
flakes in the air at temperatures ranging from 23 °C to 525 °C and relative humidities of 10%-60% by using atomic force microscopy (AFM), Raman spectroscopy and x-ray photoelectron spectroscopy. Our study reveals the formation of a uniform nanometer-thick physical adsorption layer on the surface of MoS
, which is attributed to the adsorption of ambient moisture. This physical adsorption layer acts as a thermal shield of the underlying MoS
lattice to enhance its thermal stability and can be effectively removed by an AFM tip scanning in contact mode or annealing at 400 °C. Our study shows that high-temperature thermal annealing and AFM tip-based cleaning result in chemical adsorption on sulfur vacancies in MoS
, leading to p-type doping. Our study highlights the importance of humidity control in ensuring reliable and optimal performance for MoS
-based electronic and electrochemical devices and provides crucial insights into the surface engineering of MoS
, which are relevant to the study of other two-dimensional transition metal dichalcogenide materials and their applications. |
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ISSN: | 0957-4484 1361-6528 |
DOI: | 10.1088/1361-6528/ace1f7 |