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Giant magnetoresistance at low fields in [(Ni x Fe1− x ) y Ag1− y ]/Ag multilayers prepared by molecular-beam epitaxy

The structural and magnetic properties of [111]-oriented multilayers comprising ferromagnetic films of Permalloy-silver alternating with Ag spacer films are described. The multilayers are grown by molecular-beam epitaxy on Pt(111) seed films on sapphire (0001) substrates at temperatures in the range...

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Bibliographic Details
Published in:Journal of applied physics 1994-09, Vol.76 (6), p.3688-3694
Main Authors: Farrow, R. F. C., Marks, R. F., Rabedeau, T. A., Toney, M. F., Dobbertin, D., Beyers, R., Parkin, S. S. P.
Format: Article
Language:English
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Summary:The structural and magnetic properties of [111]-oriented multilayers comprising ferromagnetic films of Permalloy-silver alternating with Ag spacer films are described. The multilayers are grown by molecular-beam epitaxy on Pt(111) seed films on sapphire (0001) substrates at temperatures in the range 25–175 °C. For a series of multilayers with similar bilayer periods (≂50 Å) the magnetoresistance (MR) is found to be strongly dependent on both growth temperature and subsequent annealing temperature. The multilayers exhibit a negative magnetoresistance in the as-grown state which more than doubles when the growth temperature is increased from 25 to 100 °C; however, the highest MR (peak 5.6%; maximum slope 0.4% per Oe) is obtained by annealing (at 400 °C) multilayers grown at 100 °C. The primary effects of annealing are an improvement of structural order, partial segregation of Ag from the ferromagnetic films into adjacent Ag films, a slight decrease in laminar order, and a reduction in long-wavelength roughness of the multilayer interfaces. No evidence is found for discontinuities in the magnetic layers with the highest MR.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.357437