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Nonconvex Hamiltonians in three dimensional level set simulations of the wet etching of silicon
It is shown that profile evolution during anisotropic wet etching of silicon can be described by the nonconvex Hamiltonian arising in the Hamilton-Jacobi equation for the level set function. Etching rate function is determined on the basis of the silicon symmetry properties. An extension of the spar...
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Published in: | Applied physics letters 2006-11, Vol.89 (21), p.213102-213102-2 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | It is shown that profile evolution during anisotropic wet etching of silicon can be described by the nonconvex Hamiltonian arising in the Hamilton-Jacobi equation for the level set function. Etching rate function is determined on the basis of the silicon symmetry properties. An extension of the sparse field method for solving three dimensional level set equations in the case of nonconvex Hamiltonians is presented. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2388860 |