Diffusion barrier properties of carboxyl- and amine-terminated molecular nanolayers

Molecular nanolayers are attractive for preserving the integrity of Cu -dielectric interface in sub- 50 nm interconnect structures. Here, we demonstrate the use of carboxyl- and amine-terminated self-assembled molecular layers (SAMs) to immobilize Cu at the Cu ∕ SiO 2 interface. Amine-terminated SAM...

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Bibliographic Details
Published in:Applied physics letters 2004-07, Vol.85 (4), p.579-581
Main Authors: Ganesan, P. G., Singh, A. P., Ramanath, G.
Format: Article
Language:English
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Summary:Molecular nanolayers are attractive for preserving the integrity of Cu -dielectric interface in sub- 50 nm interconnect structures. Here, we demonstrate the use of carboxyl- and amine-terminated self-assembled molecular layers (SAMs) to immobilize Cu at the Cu ∕ SiO 2 interface. Amine-terminated SAMs at the Cu ∕ SiO 2 interface increase the Cu diffusion-induced device failure time by a factor of 3 compared to interfaces without a barrier. Carboxyl-terminated SAMs obtained by grafting succinyl chloride onto the amine-terminated SAM show more than an additional factor of 4 increase in failure time. Coordination complex formation though strong interactions between COOH and Cu + at the Cu ∕ SAM interface is the likely reason for the effective immobilization of Cu .
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1775035