Effects of natural and electrochemical oxidation processes on acoustic waves in porous silicon films

Brillouin scattering has been performed to study the effects of natural and electrochemical oxidation on the surface and bulk acoustic mode properties of porous silicon films. The acoustic mode frequencies are observed to decrease with increasing oxidation time and this is attributed to the progress...

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Bibliographic Details
Published in:Journal of applied physics 2003-07, Vol.94 (2), p.1243-1247
Main Authors: Fan, H. J., Kuok, M. H., Ng, S. C., Lim, H. S., Liu, N. N., Boukherroub, R., Lockwood, D. J.
Format: Article
Language:English
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Summary:Brillouin scattering has been performed to study the effects of natural and electrochemical oxidation on the surface and bulk acoustic mode properties of porous silicon films. The acoustic mode frequencies are observed to decrease with increasing oxidation time and this is attributed to the progressive transformation of silicon–silicon bonds on the inner pore walls into SiO2. The dependence of the surface and bulk acoustic mode frequencies on the natural oxidation time allows the evaluation of these wave frequencies for a porous-SiO2 glass film, and hence the estimation of its bulk modulus. Both Brillouin and Raman data confirm the expectation that oxidation leads to a reduction in silicon nanoparticle size, and provide a correlation between the redsifted acoustic mode frequency and the oxidation period.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1583148