A combined in   situ optical reflectance–electron diffraction study of Co/Cu and Co/Au multilayers grown by molecular beam epitaxy

The variation in optical reflectance during growth was investigated in situ for Co/Cu and Co/Au multilayers prepared in a molecular beam epitaxy (MBE) chamber, while the specular RHEED (reflection high energy electron diffraction) intensity was simultaneously monitored. The experimental reflectance...

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Bibliographic Details
Published in:Applied physics letters 1996-06, Vol.68 (26), p.3740-3742
Main Authors: Emmerson, C. M., Shen, T-H., Evans, S. D., Allinson, H.
Format: Article
Language:English
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Summary:The variation in optical reflectance during growth was investigated in situ for Co/Cu and Co/Au multilayers prepared in a molecular beam epitaxy (MBE) chamber, while the specular RHEED (reflection high energy electron diffraction) intensity was simultaneously monitored. The experimental reflectance data were found to agree well with the prediction of a numerical simulation. The final reflectance and the effective optical constants of the films are affected by the modulation of the multilayer structures. The RHEED data indicated different growth behaviors for Cu and Au and an unexpected drop in reflectance for the initial deposition of Cu on Co layers was confirmed. A similar effect was observed for the growth of Au on Co.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.115991